ChemicalLog
The following is a list of chemicals stored in the SNF
ChemicalLog
Solvent
Resist
Developer
Acid and Etchant
Sufactant
Comments
Solvent
Chlorobenzene
NMP
Acetone
IPA
Resist
S1813
AZ6612
AZnLOF2020
PMMA 950K A3
PMMA 950K A4
LOR5A
PA400R
Developer
MIBK
AZ300MIF
AZ826
PA401D
Acid and Etchant
HCl (37%)
H2SO4
(96%)
HCl (10%) for oxide removal
HCl (1%) for etchant mix
Premix
GaAs
HF etch:
H2O
[60], Buffered HF(7:1)[6],
H2O2
[3]
Premix Sulfuric etch
H2O2
(31%)
Sufactant
Triton X100 (20ml of Triton diluted with 200ml of
H2O
)
Agepon (0.5%)
NCW01 (100%)
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Topic revision:
30 Mar 2010,
AndrewSee
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